Dan McCann
02-12-2010, 01:04 PM
Ultratech Inc. (http://ultratech.com/) has introduced a new lithography system, the Sapphire 100, for high-brightness, light-emitting diode manufacturing (HBLED). The San Jose, Calif.-based company, which supplies lithography and laser processing systems used to manufacture semiconductor devices, said the new lithography system incorporates its patented Machine Vision System, designed to deliver optimal alignment flexibility.
http://www.micromanufacturing.com/images/products/Sapphire100.jpg
“Today, approximately 25 percent of electricity is used for lighting,” said Doug Anberg, Ultratech’s vice president of advanced stepper technology. “As energy conservation efforts continue to increase, we expect lighting products with HBLED technology to be in high demand.”
Currently in beta testing, the Sapphire 100 lithography system will be available in the second half of 2010.
http://www.micromanufacturing.com/images/products/Sapphire100.jpg
“Today, approximately 25 percent of electricity is used for lighting,” said Doug Anberg, Ultratech’s vice president of advanced stepper technology. “As energy conservation efforts continue to increase, we expect lighting products with HBLED technology to be in high demand.”
Currently in beta testing, the Sapphire 100 lithography system will be available in the second half of 2010.